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个人信息：Personal Information
教授 博士生导师 研究生导师
性别：男
学历：博士研究生毕业
学位：工学博士学位
在职信息：在岗
所在单位：先进材料与纳米科技学院
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微电子材料与器件方面的研究，涉及铁电薄膜及其存储器、氧化物半导体器件的制备、微观结构表征、畴动力学、电学性能和可靠性等方面。
- Orientation independent growth of uniform ferroelectric Hf0.5Zr0.5O2 thin films on silicon for high-density three-dimensional memory applications.Advanced Functional Materials.2022,32(49):2209604
- Intrinsic 90° charged domain wall and its effects on ferroelectric properties.Acta Materialia.2022,232:117920-1–117920-11
- Robustly stable ferroelectric polarization states enable long-term nonvolatile storage against radiation in HfO2-based ferroelectric field-effect transistors.ACS Applied Materials and Interfaces.2022,14(45):51459–51467
- Robustly stable intermediate memory states in HfO2-based ferroelectric field-effect transistors.Journal of Materiomics.2022,8(3):685–692
- Flux-closure domains in PbTiO3/SrTiO3 multilayers mediated without tensile strain.Journal of Physical Chemistry C.2022,126(9):4630–4637
- Interface effects induced by a ZrO2 seed layer on the phase stability and orientation of HfO2 ferroelectric thin films: a first-principles study.Physical Review Applied.2021,16(4):044048-1–044048-9
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